晶圆加工生产线蚁群优化排程方法

©1994-2010ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.()JTsinghuaUniv(Sci&Tech),200747S22007,Vol.47,No.S239ö50189021894,,(,200092):2007204212:(70531020,60374005);(2002CB312002):(1975),(),,E2mail:[e-mail]:,,(LSM2WFL),(LSA2WFL),LSA2WFL:;;;:TN305:A:100020054(2007)S221890205Antcolonyoptimization-basedsequencingmethodforwaferfabsLILi,QIAOFei,TIANXiaoyu(SchoolofElectronics&InformationEngineering,TongjiUniversity,Shanghai200092,China)Abstract:Asequencingmodelforwaferfabswasdesignedbasedontheirsequencingcharacteristics.Afour2layerantcolonyoptimization2basedsequencingmethodwasthendeveloped.Themethodisfastandprovidesglobaloptimization.Simulationsbasedonanactualwaferfabshowthatthemethodcouldcalculatethesequencingplanwithinathereasonabletime.Keywords:waferfabricationlines;sequencing;antcolonyoptimization(ACO);bottleneck,,,;(),:()()(ö)()()[1],,2:,ChoiPetri[2];Mason[3];[4],,;,,Dabbas,,[5],,,(antcolonyoptimization,ACO)©1994-2010ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.(lotssequencingmodelofwaferfabricationlines,LSM2WFL),(lotssequencingapproachforwaferfabricationlines,LSA2WFL),LSA2WFL1,24h,(LSM2WFL):MûL,PûG.(1)M={Mmnûm=1,2,,M;n=1,2,,Nm},L=L1+L2,L1=liJ0,,liJûi=1,,I;xi=1;J=J0+fi1.25h,L2={liJ0,,liJûi=1,,I;xi=0;J=J0+h},P={PTmnijûm,n,i,j},G=Ii=1NiODiJ(di-ri).:M,(manufacturingexecutionsystem,MES);M;Nmm;Mmnmn;L,,;liJ0i;I,WIP,;xii,i,xi=1;,xi=0;liJi;h,;fii,;1.252007;P,MES;PTmnijlijMmn;G,,,,,;ridii;ODiJ=max{0,ciJ-diJ},i,ciJliJ,diJliJdiJ=ri+Jj=1RPTij(di-ri)öRPTi,RPTi=Jj=1RPTijiJ,RPTii(,);Nii,,2,ACOn:m,,;,,ACO,,,,ACO(),,,ACO(LSA2WFL)LSA2WFL2:LSA2WFL21,1981,:©1994-2010ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.:,LSA2WFL21111LAS-WFL-1xiJ0mnliJ0Mmn,xiJ0mn=1;liJ0Mmn,xiJ0mn=0;RTiJ0mnliJ0Mmn;xmMm,xm,xm=1;,xm=0;xijmlijMm,xijm=1;,xijm=0;SmnMmn;TaskmMm;TaskmnMmn;BmnMmn;MrmnMmn,r=1,,R1:,MESWIP,,1)xixmxiJ0mn10;2)xiJ0m=1,Taskmn=liJ0RTiJ0mn;,Taskmn=ÁRTiJ0mn=0;3)Taskm=Á4)Smn=1-RTiJ0mnmaxn(RTiJ0mn)+1,(2)Smn,2:(1)lijMm,xijm=1,Taskm=Taskmlij;,xijm=03:TaskmTaskmn1LSA-SWF-11)Mmö,TaskmTaskmn,,Taskmn,TaskmMmnpmn=SAmnGBmnnSAmnGBmn.(3):Gmn-Gmn=1-PijmnnPijmn,Mmn;AB;MmnMmn,RTiJ0mn=RTiJ0mn+Pijmn,(2)MmSmn2)Mm,2TaskmTaskmna)Taskm,(4),Bmn,2981()2007,47(S2)©1994-2010ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.=Time,j=J0,Esptlr=Time+RTiJ0mn+1.25Sum(J0+1,j-1),jJ0&xi=1&xiJ0mn=1,Esptlr=Time+1.25Sum(J0,j-1),jJ0&xi=1&xiJ0mn=0,Esptlr=Time+RTiJ0mn+fi3Sum(J0+1,j),jJ0&xi=0&xiJ0mn=1,Esptlr=Time+fi3Sum(J0,j),jJ0&xi=0&xiJ0mn=0.(4):Esptlr;Timeb)TaskmTaskmn,ö2.2LSA-WFL-2LSA2WFL22LSA2WFL,,,4LSA2WFL22,;;ö1),,ACO,,1:2:Taskmn3:xiJ0mn=1,liJ0,liJ0;,Taskmn,Taskmn4:(5),,,,pxyk=(Sxy)A11LSyk+1B1ySk(Sxy)A11LSyk+1B1,LSyk=maxRyk+yjj=1Pijmn(Dyk-Ryk)yPijmn-Fyk(Dyk-Ryk),0.(5):xyk;pxykkyx;Sxy(x,y);LSykkyx,y(y);A1B1(1);RykDyky;yjj=1Pijmnyy;yPijmny;Fykkyx,y5:(24h),,,7;,66:(6),2Sxy(t+1)=QSxy(t)+$Sxy(t),$Sxy(t)=k1öGk.(6):Q;Gkk7:3981,:©1994-2010ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.(),2)2:;,,1:xiJ0mn=1,liJ0Mmn;,Mmn2:Taskmn,Mmn3:Mmn,4;,54:,55:Mmn,6;,76:,77:,,3;,88:,Mmn,Mmn3)öö,4),3,3C#141,8,180EMPLANT,LSA2WFL24hABA1B1Q11110.8,50,15min,,,,2%3%,4,ACOLSA2WFL,,(References)[1],,,.[M].,2006.WUQidi,QIAOFei,LILi,etal.SemiconductorManufacturingSystemScheduling[M].Beijing:PublishingHouseofElectronicsIndustry,2006.(inChinese)[2]JinYoungChoi,ReveliotisSA.Ageneralizedstochasticpetrinetmodelforperformanceanalysisandcontrolofcapacitatedreentrantlines[J].IEEETransactionsonRoboticsandAutomation,2003,19(3):474-480.[3]MasonSJ,OeyK.Schedulingcomplexjobshopsusingdisjunctivegraphs:Acycleeliminationprocedure[J].InternationalJournalofProductionResearch,2003,41(5):981-994.[4],,.[J].,2000,29(5):425-430.WEIJunhu,GUANXiaohong,SUNGuoji.Optimizationmethodologyinsimulationbasedschedulingforsemiconductormanufacturing[J].InformationandControl,2000,29(5):425-430.(inChinese)[5]DabbasRM.Anewschedulingapproachusingcombineddispatchingcriteriainsemiconductormanufacturingsystems[D].TempeAZ:ArizonaStateUniversity,1999.4981()2007,47(S2)