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IWO3薄膜的光催化性能研究摘要薄膜材料是相对于半导体材料而言的，是人们采用特殊的方法，在半导体材料的表面沉积或制备的一层性质与半导体材料完全不同的物质层。薄膜材料因具有光学性质、电学性质、磁学性质、化学性质、力学性质、热学性质等多种特性在许多领域得到应用，如电学薄膜、光学薄膜、硬质膜、耐蚀膜、润滑膜、装饰膜、包装膜等。光催化剂在光照的条件下能够产生强氧化性的自由基，该自由基能彻底降解几乎所有的有机物，并最终生成H2O、CO2等无机小分子，加上光催化反应还具有反应条件温和，反应设备简单，二次污染小，操作易于控制，催化材料易得，运行成本低，可望用太阳光为反应光源等优点。研究表明WO3光催化稳定性良好，对光催化降解水中污染物也有较理想的催化效果,而且我国钨蕴藏丰富,居世界第一，WO3有广泛来源。本实验采用钨粉过氧化聚钨酸法制备基础溶胶，在溶胶中采取添加与无添加草酸对比研究其效果，找出影响WO3薄膜光催化性能的主要因素，研究其对WO3薄膜的成膜性、表面形貌、光催化性能的影响。研究发现在溶胶中添加草酸后WO3薄膜的光催化性能更佳，降解率也有所提高。采用光催化实验分别研究优化的浸渍提拉工艺，脉冲电泳沉积工艺及直流电沉积工艺参数对WO3薄膜光催化性能的影响，找出影响薄膜性能的主要因素，分别对比分析直流电沉积工艺，浸渍提拉工艺及脉冲电泳沉积工艺，研究这三种成膜方式对WO3薄膜光催化性能的影响。研究证明在三种工艺添加草酸后制备的WO3薄膜光催化性能更佳，降解率也比起无添加草酸有提高，最终得到三种工艺当中不管是添加或无添加草酸，直流电沉积工艺制备的WO3薄膜的光催化性能最佳，罗丹明B的降解率也达到了最高。关键词：WO3薄膜，光催化，浸渍提拉工艺，脉冲电泳沉积工艺，直流电沉积工艺，过氧化聚钨酸福州大学本科生毕业论文IIWO3thinfilmphotocatalyticpropertiesAbstractPeoplewithaspecialmethodinsemiconductormaterialsurfacepreparationalayeroffilmmaterials，itiscompletelydifferentphysicalitytosemiconductormaterial.Filmmaterialsbecauseofitsopticalproperties,electricalproperties,magneticproperties,chemicalandmechanicalproperties,thermalproperties,suchasvariouscharacteristicsinmanyareastobeapplicationssuchaselectricalfilm,opticalthinfilm,hardfilm,corrosionresistantfilm,lubricant,decorativemembrane,packagingfilm,etc.Lightundertheconditionofcatalystsintheilluminationcanproducestrongoxidizingfreeradicals,thisfreeradicalscanthoroughlydegradedalmostalloftheorganicmatter,andultimatelygenerateH2O,CO2andotherinorganicofsmallmolecules,plusphotocatalyticreactionalsohasmildreactioncondition,reaction,theequipmentissimple,secondarypollutionsmall,operationeasycontrol,catalyticmaterials,lowcostandeasyoperationwiththesunlightisforreactionetc.ResearchshowsthatWO3photocatalyticgoodstability,lightcatalyticdegradationwaterpollutantshaveidealcatalyticeffect,andChina'stungstenrich,rankingthefirst,haveextensiveWO3source.Thisexperimentusedtungstenpowdertogetherperoxidebasedsolpreparedtungstenacidlegalsystemadoptedinsol,addandnon-increaseoxalicacidcontrastresearchitseffect,affectingtheWO3filmlightcatalyticproperties,studythemainfactorsoftheWO3filmintothemembranous,surfacemorphology,photocatalyticperformanceinfluence.Thestudyfoundthattheaddedafteroxalatesol-gelthinWO3photocatalyticdegradationrateperformanceisbetter,hasalsoimproved.Researchbyphotocatalyticexperimentswereoptimizedmaceratetirascraft,pulseelectrophoresisdepositionprocessanddcWO3thinfilmdepositionprocessparametersontheeffectoflightcatalyticproperties,findoutthemainfactorsofinfluencefilmpropertiesrespectively,sedimentaryprocesses,comparisonandanalysisofthedctilakprocessandpulseelectrophoresisimpregnationsedimentaryprocesses,researchthethreefilmofphotocatalyticWO3filmwayproperties.ResearchproofinthreeprocessaftertheWO3addoxalatepreparationoffilmphotocatalyticdegradationrate,performanceisbetterthannon-increaseoxalicacidhavealsoincreased,eventuallygetthreeprocessaddornon-increaseamongbothsedimentaryfabricationprocessesofoxalicacid,dcWO3filmthebestperformanceofthephotocatalyticdegradationrates,LuoDanMingBalsoreachedthehighest.Keywords:WO3Film,Photocatalytic,Dip-coatingtechnique,pulsedelectrophoreticdepositionprocess,DCcurrentprocess,peroxideDecatungstateI目录摘要..................................................................................................................................................IAbstract..........................................................................................................................................II第1章绪论...................................................................................................................................11.1引言.......................................................................................................................................11.2光催化剂及分类...................................................................................................................21.2.1常见光催化剂................................................................................................................21.2.2纳米光催化剂................................................................................................................31.3光催化机理...........................................................................................................................31.4光催化技术的应用...............................................................................................................41.4.1废水处理........................................................................................................................41.4.2空气净化........................................................................................................................41.4.3超亲水性........................................................................................................................41.5氧化钨...................................................................................................................................51.5.1WO3的晶格特征...........................................................................................