Sentaurus讲解楼海君PekingUniversityShenzhenGraduateSchoolShenzhen,Guangdong,ChinaMicro-NanoElectronicDeviceandIntergrationResearchCenter2011.09.19Sentaurus各模块介绍Sentaurus器件模拟流程演示Sentaurus代码详细介绍Micro-NanoElectronicDeviceandIntergrationResearchCenter提纲Sentaurus简介Sentaurus各模块介绍Sentaurus器件模拟流程演示Sentaurus代码详细介绍Micro-NanoElectronicDeviceandIntergrationResearchCenter提纲Sentaurus简介Synopsys公司最新发布的TCAD工具命名为SentaurusTCAD,它是Synopsys公司收购瑞士ISE(IntegratedSystemsEngineering)公司后发布的产品,SentaurusTCAD全面继承了ISETCAD,Medici和Tsuprem4的所有特性及优势,它包含众多的组件,主要由SentaurusDevice,SentaurusProcess,DeviceEditor,Workbench等模块构成。SenTaurusDevice整合了Avanti的Medici、TaurusDevice及ISE的DESSIS器件物理特性级仿真工具,充实并修正了诸多器件物理模型,推出了新的器件物理特性分析工具SenTaurusDevice。Sentaurus简介SentaurusDevice模块;SentaurusProcess模块;DeviceEditor模块;Workbench模块SentaurusProcess整合了:⑴Avanti公司的TSUPREM系列工艺级仿真工具(Tsupremⅰ、Tsupremⅱ、Tsupremⅲ只能进行一维仿真,到了第四代的商业版Tsuprem4能够完成二维仿真模拟);⑵Avanti公司的TaurusProcess系列工艺级仿真工具;⑶ISE(IntegratedSystemsEngineering)公司的ISETCAD工艺级仿真工具Dios(二维工艺仿真)FLOOPS-ISE(三维工艺仿真)Ligament(工艺流程编辑)系列工具,将一维、二维和三维仿真集成于同一平台。Sentaurus各模块介绍Sentaurus器件模拟流程演示Sentaurus代码详细介绍Micro-NanoElectronicDeviceandIntergrationResearchCenter提纲Sentaurus简介¾SentaurusWorkbench(SWB)Sentaurus各模块介绍出现。。。主要用到:其他模块¾SentaurusStructureEditor界面上主要的功能键介绍¾SentaurusInspect¾SentaurusTecplotSentaurus各模块介绍Sentaurus器件模拟流程演示Sentaurus代码详细介绍Micro-NanoElectronicDeviceandIntergrationResearchCenter提纲Sentaurus简介开启Sentaurus点Project-点New-点NewProjectSentaurus器件模拟流程演示在FamilyTree下NoTool处点鼠标右键点Add点Tools...点SentaurusSE后面连续跳出对话框时都直接点ok在出现的SentaurusSE图标上鼠标右击点Editinput点Commands在跳出的对话框选择Yes将下页文档贴入跳出的文本编辑器并存储(sdegeo:create‐rectangle(position0(‐0@toxf@)0.0)(position@L@00.0)SiO2oxidef)(sdegeo:create‐rectangle(position000.0)(position@L@@tsi@0.0)Siliconbody)(sdegeo:create‐rectangle(position0@tsi@0.0)(position@L@(+@tsi@@toxb@)0.0)SiO2oxideb)(sdegeo:create‐rectangle(position‐0.0200.0)(position0@tsi@0.0)Siliconsource)(sdegeo:create‐rectangle(position@L@00.0)(position(+@L@0.02)@tsi@0.0)Silicondrain)(sdegeo:define‐contact‐setgf4(color:rgb100)##)(sdegeo:define‐contact‐sets4(color:rgb100)##)(sdegeo:define‐contact‐setd4(color:rgb100)##)(sdegeo:define‐contact‐setgb4(color:rgb100)##)(sdegeo:define‐2d‐contact(list(car(find‐edge‐id(position(/@L@2)(‐0@toxf@)0))))gf)(sdegeo:define‐2d‐contact(list(car(find‐edge‐id(position‐0.02(/@tsi@2)0))))s)(sdegeo:define‐2d‐contact(list(car(find‐edge‐id(position(+@L@0.02)(/@tsi@2)0))))d)(sdegeo:define‐2d‐contact(list(car(find‐edge‐id(position(/@L@2)(+@tsi@@toxb@)0))))gb)(sdedr:define‐constant‐profileCPD_bodyBoronActiveConcentration@nbody@)(sdedr:define‐constant‐profile‐regionPlacement_bodyCPD_bodybody)(sdedr:define‐constant‐profileCPD_sourcePhosphorusActiveConcentration@nsource@)(sdedr:define‐constant‐profile‐regionPlacement_sourceCPD_sourcesource)(sdedr:define‐constant‐profileCPD_drainPhosphorusActiveConcentration@ndrain@)(sdedr:define‐constant‐profile‐regionPlacement_drainCPD_draindrain)(sdedr:define‐refinement‐sizeRefinementDefinition_oxidef(/@L@5)(/@toxf@4)(/@L@10)(/@toxf@10))(sdedr:define‐refinement‐regionRefPla_oxidefRefinementDefinition_oxidefoxidef)(sdedr:define‐refinement‐sizeRefinementDefinition_oxideb(/@L@5)(/@toxb@4)(/@L@10)(/@toxb@10))(sdedr:define‐refinement‐regionRefPla_oxidebRefinementDefinition_oxideboxideb)(sdedr:define‐refinement‐sizeRefinementDefinition_body(/@L@20)(/@tsi@40)(/@L@50)(/@tsi@80))(sdedr:define‐refinement‐regionRefPla_bodyRefinementDefinition_bodybody)(sdedr:define‐refinement‐sizeRefinementDefinition_source0.005(/@tsi@5)0.002(/@tsi@10))(sdedr:define‐refinement‐regionRefPla_sourceRefinementDefinition_sourcesource)(sdedr:define‐refinement‐sizeRefinementDefinition_drain0.005(/@tsi@5)0.002(/@tsi@10))(sdedr:define‐refinement‐regionRefPla_drainRefinementDefinition_draindrain)在左图红圈位置点右键选择Add...跳出添加参数对话框后:在parameter填入参数名称:ndrain在DefaultValue中填入默认值:1e20按上一步的方法继续添加参数:nsource,nbody,tsi,toxb,toxf,L(注意大小写)默认值分别是:1e20,1e16,2e-22e-3,2e-3,0.05左键点nsource下面的值,1e20变成蓝色高亮点上面菜单的Nodes,然后选择Run在下面跳出问是否存储的对话框选yes,然后点Run跳出一个图形界面显示运行后得到的双栅结构,如右图:关闭该图形界面,无需存储在FamilyTree中加入sdevice工具(演示2、3中有具体步骤)在sdevice图标上鼠标右击点Editinput点Commands在跳出的对话框选择Yes将下页文档贴入跳出的文本编辑器并存储File{*InputFilesGrid=@grid@Doping=@doping@Parameter=@parameter@*OutputFilesPlot=@tdrdat@Current=@plot@Output=@log@}Electrode{{Name=sVoltage=0.0}{Name=dVoltage=0.0}{Name=gfVoltage=@Vgf@}{Name=gbVoltage=@Vgb@}}Physics{}Plot{eDensityhDensityeCurrenthCurrentPotentialSpaceChargeElectricFieldeMobilityhMobilityeVelocityhVelocityDopingDonorConcentrationAcceptorConcentrationeQuasiFermihQuasiFermi}Math{Extrapolate*offbydefaultRelErrControl*onbydefaultIterations=20*default=50Notdamped=100*default=1000}Solve{*-Build-upofinitialsolution:Coupled(Iterations=100){Poisson}Coupled{PoissonElectronHole}Quasistationary(InitialStep=1e-3Increment=1.35MinStep=1e-5MaxStep=0.02Goal{Name=dVoltage=@Vd@}){Coupled{PoissonElectronHole}}}在sdevice下加入参数Vd,VgbVgf,默认值均为0.5,并运行(仿照步骤7,8,9)运行后失败变红色而不是成功变黄色,原因是没有定义模拟需要的物理参数,如硅介电常数之类在SentaurusSE图标上鼠标右击点Editinput点Parameters选Yes后重新Run运行成功变为黄色后,点中使之变为蓝色高亮左击“眼睛”图标-