Filmetrics_F20_Thin-Film_Analyzer

 Northwestern University Micro/Nano Fabrication Facility (NUFAB) Page1 of 3 1.0FilmetricsF20Thin-FilmAnalyzerFigure1:FilmetricF20ThinFilmAnalyzer1.1IntroductionTheFilmetricsF20isusedtomeasurethethicknessandopticalconstants(nandk)ofdielectricandsemiconductorthinfilms.Commonlymeasuredfilmsincludesemiconductorprocessfilmssuchasoxides,nitrides,resists,andpolysilicon,andopticalcoatingssuchashardnessandanti-reflectioncoatings,flatpaneldisplayfilmssuchaspolyimides,resist,cellgaps,andvariouscoatingsusedinCDandDVDmanufacture.Filmsthatcannotbemeasuredincludeveryroughfilmsandmetalfilms.TheF20measuresthin-filmcharacteristicsbyreflectinglightthroughthesampleoverarangeofwavelengths.Becauseofitswave-likeproperties,lightreflectedfromthetoporbottominterfacesofacertainfilmcanbein-phasesothatreflectionsadd,orout-of-phasesothatreflectionssubtractdependingonthewavelength.Theresultisacharacteristicintensityoscillationsinthereflectancespectrum(intensityvs.wavelength).Ingeneral,thethickerthefilm,themoreoscillationsthereareinagivenwavelengthrange.Onlytrainedandapproved(qualified)Usersmayusethistool.1.2FeaturesandSpecifications:a)Regulatedtungsten-halogenlampwithwavelengthrange400to1000nm.b)Lightspotsize~1.5mm.c)Filmthicknessrange:150Åto50µm.d)Filmthicknessrangeformeasuringnandk:1000Åto5µm.e)Accuracy:thegreaterof0.4%or10Åf)Precision:1Å.g)Stability:0.7Å.1.3ApplicableDocumentsa)F20operatingmanual-hardcopylocatedatmachine. Northwestern University Micro/Nano Fabrication Facility (NUFAB) Page2 of 3 1.4SafetyTherearenoparticularsafetyrequirementsotherthanthoserelatedtoelectronicinstrumentsorcomputers.CAUTION:Opticalfiberswillbedamagedifbentortwisted.Donottouchthoseifnotnecessary.1.5OperatingProcedureFigure2:F20andsamplestage.1.5.1Startupa)ActivatetheequipmentinFOMb)Turnonthelightsource(greenswitchinFigure2).c)Turnonthecomputer.d)LaunchtheFILMeasureprogramfromthedesktop.1.5.2Shut-downa)ClosetheFILMeasuresoftware.b)Turnoffthecomputer.c)Turnoffthelightsource(greenswitchinFigure2).d)DeactivatetheequipmentinFOM.1.5.3QuickThicknessMeasurementa)ClickonEditStructurebutton.Enteryoursample’slayerstructure.Enteryourbestestimateoffilmthickness.b)ClickonBaselinebutton.Placethereferencewaferonthestage.Specifythereferencewafermaterial. Northwestern University Micro/Nano Fabrication Facility (NUFAB) Page3 of 3 Followtheinstructionsinthedialogboxes.c)Placethewafertobemeasuredonthestage.ClickMeasure.d)Thicknesswillbedisplayed.e)Ifthemeasurementwassuccessful,theminimaandmaximaofthecalculatedreflectancespectrum(redline)willcoincideinwavelengthwiththeminimaandmaximaofthemeasuredreflectance(blueline).f)Referencesampledoesnothavetobethesubstratematerialofthesampletobemeasuredaslongasithasthesimilarreflectance.g)Note:Tomeasuresmallpatterns,ifyoudon’tseethelightspotonyoursample,usetweezersinthelightpathtolocatethespotandmoveyourpatternunderit.h)Ifyouaremeasuringcomplicatedstructuresandarehavingproblems,readthemanualoraskthestaff.i)ProvidethenecessaryinformationinFOManddeactivatetheinstrument.