Silicon Wafer简介

Website::●WhatistheSiliconWafer?●Wherearetheyused?●BasicParameters●TheTypeofSiliconWafers●WaferProcessFlow●EPIIntroduction●SOIIntroduction●theStatesofSemiconductorIndustryWebsite::Guiye,JiangtongHighPureCopperCathodesQualitystandard:GB/T467-1997Typespecifications:Cu-CATH-1Technicalindex:Cu+Ag=99.95%Annualproduction:750,000tonsRegisterthesituation:LME,SHFEFigure1：SiliconWaferDefinition:theproductionusedsemiconductorintegratedcircuits(IC)orsolarcells,becauseofitsshapeisround,itisknownastheSiliconWafer.Itcanbeprocessedintovariouscircuitelementstructure,andbecomeaspecificfeatureoftheICelectricalproductsorsolarcells.Website:!Website:(FixedQualityArea):thecentralareaofawafersurface,definedbyaEE.PrimaryFlat:theflatoflongestlengthonthewafer,orientedsuchthatthechordisparallelwithspecifiedlowindexcrystalplane;sometimescalledMajorFlat.SecondaryFlat:aflatoflengthshorterthantheprimaryorientationflat,whosepositionwithrespecttotheprimaryorientationflatidentifiesthetypeandorientationofthewafer.Website::anintentionallyfabricatedindentofspecifiedshapeanddimensionsonasiliconwaferorientedsuchthatthediameterpassingthroughthecenterofthenotchisparallelwithaspecifiedlowindexcrystaldirection.Note:Forlargerwafers≥200mm,notchesarepredominantlyused;Forwafersupto150mm,flatsareusedforaligningandcrystalorientation.Website:://–GrowthMethodCZ（Czochralski）Website:–GrowthMethodFZ（FloatingZone）Website:(Czochralski)★85%oftotalsemiconductorproduct★DRAM,SRAM,ASIC★Largesizewafer(ingot)★Cheaper★ReusablematerialsFZ(FloatingZone)★15%oftotalsemiconductorproduct★Highpowerdevices★Smallerwafersize(150mm)★Moreexpensive★forextremelyhighpuritywaferNote:98%oftotaldevicesusesinglecrystalSianewmethodcalledMCz(MagneticCzochralski)isusednow,whichisatypecrystalgrowththatgenerallyyieldscrystalswithloweroxygencontentthanCzgrowth.Website:–CrystalOrientationWebsite:–CrystalOrientationWebsite:–CrystalOrientationNote:hklstandsforcrystalorientation;(hkl)standsforcrystalplaneWebsite:–CrystalOrientationSingleCrystalCharacteristic-AnisotropicNote:★Asleftpicture,thedensityof(100)Orientationisbiggerthan(111)Orientation.★Thedifferentorientationshavedifferentbenefitsandareusedindifferenttypesofchips.Website::(SilicononInsulator):amultilayerstructureofoxideandsiliconwithathinfilmofsiliconseparatedfromabasesiliconsubstratebyanBOX(buriedoxidelayer).EPI(epitaxial):polished,monocrystallinesiliconwafercoveredonitsfrontsurface,edge,andnearedgeregionofthebacksurfacewithalayerofmonocrystallinesilicondepositedfromahomogeneousorheterogeneousphase.Thereare2”,3”,4”,5”,6”,200mm,300mm,450mmaccordingtowafersize.SiliconWaferPhotovoltaicSolarCellGradeICGradeSOIPolishedWaferEPIAnnealedWaferWebsite::asiliconwafersuitableformonitoringthermalprocessesorasanimplantmonitor,usuallyusedonlyinacleanroomenvironment.MechanicalWafer:asiliconwafersuitableforequipmentorprocesstesting,usuallyoutsideofacleanroomenvironment.MechanicalTestWafer:asiliconwafersuitablefortestingequipmentwithemphasisondimensionalandstructuralcharacteristicsonly.ResistivityReferenceWafer:acertifiedreferencematerial,workingreferencematerial,orreferencematerialintheformofasiliconwaferorchipusedforroutinecalibrationorcontrolofresi