冲击电压标准装置的建立

杨迎建(武汉高压研究所,武汉430074):;Z1%,:;;:TM835.4:A:1003-6520(2006)01-0005-03EstablishingofImpulsevoltageReferenceDeviceYANGYingjian(WuhanHighVoltageResarchInstitute,Wuhan430074,China)Abstract:Thesignificationofestablishingimpulsevoltagereferencedeviceisintroduced.Thestructureanduncer-taintyofthedevicearediscussed.Usingthisimpulsevoltagereferencedevicethecertificationimpulsevoltagemeas-urementsystemcanbemade.Keywords:impulsevoltage;referencedevice;measurementuncertainty0IEC,,[1][2](),IEC,[3](IEC60060-2),,,,,,,[4]:1%;3%,:,;(),;,11.1800kV20kJ,:,(,);,1%;,0.1Ls1.2,,11.2.1HV,500kV,6ns,624.4HAEFELYDM551,0.5%PTB,,2M8,#5#32120061HighVoltageEngineeringVol.32No.1Jan.20061Fig11Impulsevoltagereferencesystem2Fig12PrinciplegraphofimpulsevoltagemeasurementsystemDL4100,100MHz,100MHz,10,1M81.2.2,,Labview,IEC1083-2(),161,3,13,13,1Tab.1ResultsofcalculationoverrunIEC14.DATIEC04.DATIEC09.DAT/MV-1.07-0.97~-0.951.020.96~0.991.020.96~0.99/Ls2.381.85~2.051.141.0~1.11.141.0~1.1/Ls39.2843~4746.6448~5246.6048~521.3,(3),22.1500kV;(2)N1,N2,N=N1N2tA,B,x(t),f(tA,B)():y(t)=N1N2f(TA,B)x(t)4,u(N1)u(N2)u(f)u(x)N1N2fx,:uc(y)/y=u2(N1)N21+u2(N2)N22+u2(f)f2+u2(x)x2AB[4],A,;B,2.2AuA,BuB1uB2uB3,,u(N1)=u2A+u2B1+u2B2+u2B3=0.62612.3N2,x1(t),x(t),N2=x1(t)/x(t),uA#6#Jan.2006HighVoltageEngineeringVol.32No.1,,uBu(N2)=0.35%2.4[4]6ns,100ns,8ns,14.5%,utrt,,0.3%,0.273%utrt=0.3%2.510((1/2)10),u(x)=0.113%0.51%2.6ut,IEC,ut3%,,utZ3%32001(20,,,)/Z1%04a),,,1%;b),GB/T16927;c),[1].[M].:,1982.[2]IEC60060-2,Highvoltagetestingtechniques,Part2:Measuringsystem[S],1994.[3]GB/T16927-1997,,2:[S],1998.[4].[M].:,1996.(2006-01-12)1955)1981E-mail:[e-mail]!mmm一套电力生产运行管理者期待的好用的专业参考资料mmm一套电力技术研究者期待的全面的科研参考资料mmm一套电气设备生产经营者期待的有益的行业参考资料)GIS),()!!!:027-87445893:027-87445667E-mail:[e-mail]#7#20061321