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检测报告报告编号:第1页共14页公司名称地址样品名称样品型号/样品材质/编号/收样日期测试周期测试要求根据客户要求，对样品进行表面成分分析测试方法:测试项目测试方法测试仪器表面成分分析GB/T19500-2004XPS备注:X射线光电子能谱方法所得样品中各元素的含量仅为半定量，表面的碳氧可能为吸附引起。测试结果:见下页。编制:审核:签发:检测报告报告编号:第2页共14页测试结果：分析区域：直径400µm的圆形；信息深度：约5nm；元素的原子百分比检测下限：0.1%；测试真空度：1.8×10-9Torr。图1~图24为样品表面的XPS全谱，图25为样品表面的深度剖析图，各个元素的原子百分比含量如图中所示。深度剖析结果：从外到内第一层膜层成分为SiFOC，膜层厚度为2.5nm；第二层膜层成分为SiOx，膜层厚度为85.5nm；第三层膜层成分为ZrSiOC，膜层厚度为182nm；基材为有机物。044820.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV5.8800e+004max1.17minSur1/Full/102004006008001000120001234567x104044820.speBindingEnergy(eV)c/s-O2s-FKLL1-FKLL-F2p-C1sAtomic%F1s40.5C1s31.5O1s21.6Si2p6.4-CKLL-C1s-OKLL-O1s-Si2s-Si2p-F2s-F1s图1样品表面的XPS全谱检测报告报告编号:第3页共14页044821.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.9417e+004max1.75minSur1/Full/102004006008001000120000.511.522.5x104044821.speBindingEnergy(eV)c/sAtomic%O1s63.9Si2p33.0C1s3.1-CKLL-C1s-OKLL-O2s-O1s-Si2s-Si2p图2样品表面溅射5nm后的XPS全谱044822.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV2.0883e+004max1.75minSur1/Full/102004006008001000120000.511.522.5x104044822.speBindingEnergy(eV)c/sAtomic%O1s64.9Si2p30.4C1s4.7-Si2s-Si2p-CKLL-C1s-OKLL-O2s-O1s图3样品表面溅射10nm后的XPS全谱检测报告报告编号:第4页共14页044823.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV2.1512e+004max2.33minSur1/Full/102004006008001000120000.511.522.5x104044823.speBindingEnergy(eV)c/sAtomic%O1s65.5Si2p31.6C1s3.0-Si2s-Si2p-OKLL-O2s-O1s-C1s图4样品表面溅射15nm后的XPS全谱044824.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV2.0667e+004max1.75minSur1/Full/102004006008001000120000.511.522.5x104044824.speBindingEnergy(eV)c/sAtomic%O1s66.0Si2p30.1C1s4.0-Si2s-Si2p-C1s-OKLL-O2s-O1s图5样品表面溅射20nm后的XPS全谱检测报告报告编号:第5页共14页044825.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV2.0787e+004max2.33minSur1/Full/102004006008001000120000.511.522.5x104044825.speBindingEnergy(eV)c/sAtomic%O1s64.5Si2p31.5C1s4.0-Si2s-Si2p-C1s-OKLL-O2s-O1s图6样品表面溅射25nm后的XPS全谱044826.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.9983e+004max1.75minSur1/Full/102004006008001000120000.511.522.5x104044826.speBindingEnergy(eV)c/sAtomic%O1s63.9Si2p31.6C1s4.5-Si2s-Si2p-CKLL-C1s-OKLL-O2s-O1s图7样品表面溅射30nm后的XPS全谱检测报告报告编号:第6页共14页044827.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.9350e+004max1.75minSur1/Full/102004006008001000120000.511.522.5x104044827.speBindingEnergy(eV)c/sAtomic%O1s63.7Si2p28.8C1s7.5-Si2s-Si2p-OKLL-O2s-O1s-CKLL-C1s图8样品表面溅射35nm后的XPS全谱044828.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.7962e+004max2.33minSur1/Full/102004006008001000120000.20.40.60.811.21.41.61.82x104044828.speBindingEnergy(eV)c/sAtomic%O1s64.2Si2p31.8C1s4.0-CKLL-C1s-OKLL-O2s-O1s-Si2s-Si2p图9样品表面溅射40nm后的XPS全谱检测报告报告编号:第7页共14页044829.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.8125e+004max2.33minSur1/Full/102004006008001000120000.20.40.60.811.21.41.61.82x104044829.speBindingEnergy(eV)c/sAtomic%O1s63.6Si2p31.4C1s5.1-Si2s-Si2p-CKLL-C1s-OKLL-O2s-O1s图10样品表面溅射45nm后的XPS全谱0448210.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.7600e+004max2.33minSur1/Full/102004006008001000120000.20.40.60.811.21.41.61.82x1040448210.speBindingEnergy(eV)c/s-Zr4p-Zr3p1Atomic%O1s65.0Si2p29.8C1s3.7Zr3d1.5-Si2s-Si2p-CKLL-C1s-OKLL-O2s-O1s-Zr3s-Zr3p3-Zr3d图11样品表面溅射50nm后的XPS全谱检测报告报告编号:第8页共14页0448211.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.7550e+004max2.92minSur1/Full/102004006008001000120000.20.40.60.811.21.41.61.82x1040448211.speBindingEnergy(eV)c/s-Si2s-Zr4pAtomic%O1s62.2Si2p27.9C1s7.6Zr3d2.2-CKLL-C1s-OKLL-O2s-O1s-Si2p-Zr3s-Zr3p3-Zr3p1-Zr3d图12样品表面溅射55nm后的XPS全谱0448212.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.5712e+004max2.33minSur1/Full/10200400600800100012000200040006000800010000120001400016000180000448212.speBindingEnergy(eV)c/sAtomic%O1s62.3Si2p30.1C1s4.1Zr3d3.4-OKLL-O1s-C1s-Zr4p-Zr3s-Zr3p3-Zr3p1-Zr3d-Si2s-Si2p图13样品表面溅射60nm后的XPS全谱检测报告报告编号:第9页共14页0448213.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.6175e+004max2.33minSur1/Full/10200400600800100012000200040006000800010000120001400016000180000448213.speBindingEnergy(eV)c/s-O2sAtomic%O1s62.2Si2p20.7C1s11.4Zr3d5.7-Si2s-Si2p-Zr4p-Zr3s-Zr3p3-Zr3p1-Zr3d-CKLL-C1s-OKLL-O1s图14样品表面溅射70nm后的XPS全谱0448214.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.3760e+004max2.92minSur1/Full/102004006008001000120002000400060008000100001200014000160000448214.speBindingEnergy(eV)c/sAtomic%O1s58.8Si2p19.8C1s11.5Zr3d10.0-Si2s-Si2p-OKLL-O1s-CKLL-C1s-Zr4p-Zr3s-Zr3p3-Zr3p1-Zr3d图15样品表面溅射80nm后的XPS全谱检测报告报告编号:第10页共14页0448215.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.1230e+004max2.92minSur1/Full/1020040060080010001200020004000600080001000012000140000448215.speBindingEnergy(eV)c/sAtomic%O1s65.0Zr3d14.2Si2p13.8C1s7.0-Zr4p-Zr3s-Zr3p3-Zr3p1-Zr3d-Si2s-Si2p-CKLL-C1s-OKLL-O2s-O1s图16样品表面溅射100nm后的XPS全谱0448216.spe:04CompanyName2017Jun23Almono350.0W0.045.0°187.85eV1.1487e+004max2.33minSur1/Full/1020040060080010001200020004000600080001000012000140000448216.speBindingEnergy(eV)c/sAtomic%O1s67.7Zr3d20.0Si2p9.9C1s2.4-OKLL-O2s-O1s-CKLL-C1s-Si2s-Si2p-Zr4p-Zr3s-Zr3p3-Zr3p1-Zr3d图17样品