TFT-LCD黄光制程介绍

IVOInfoVision2020/5/13IVOCONFIDENTIALPhotoIntroductionINTArrayIVOInfoVision2020/5/13PhotoResistThinFilmGlassArrayProcessExposureLightPhotoMaskStripThinFilmGlassPRcoatingPhotoResistDevelopEtchIVOInfoVision2020/5/13PhotoProcessPhotoprocess:Coating---Exposure---DevelopmentCoating：将光阻均匀地涂布于基板表面Exposure：由紫外线透射光罩将图形转写至光阻表面Development：利用碱性显影液將紫外线照射的光阻去除以形成图形IVOInfoVision2020/5/13ThestructureofDNSSK-1100GLinear-coating(Vacuumdry)InEUVRB&AAjetAKDryOutPost-bakeDHBInOutPre-BakeTitlerorE.E.Exp.BF90°turnInOutOutAOILorConveyorAKDryRinse(Sub.Direct)Dev.1,230,7305,9105,510IVOInfoVision2020/5/13CleanerintroductionIVOInfoVision2020/5/13CleanerintroductionThesimpledrawingofcleanerIVOInfoVision2020/5/13PhotoProcess-Cleaner•目的:减小接触角和减少灰尘•控制参数:–E-UVcleanability–Rinseflowrate–Mistcontrolanddryperformance–ThinfilmconditionCleanerintroductionIVOInfoVision2020/5/13ThestructureofE-UVchamberCleanerintroductionIVOInfoVision2020/5/13ThemeasurementofcontactangleCleanerintroductionIVOInfoVision2020/5/13Thesimpledrawingofrollerbrush&AAjetrinsesectionCleanerintroductionIVOInfoVision2020/5/13AAJETCleanerintroductionIVOInfoVision2020/5/13ThebasicprincipleofinclinedrinseCleanerintroductionIVOInfoVision2020/5/13BrushstructureCleanerintroductionIVOInfoVision2020/5/13Airknife•Waterstripper•Verticaltilt60°•Horizontaltilt60°CleanerintroductionIVOInfoVision2020/5/13ThedryprocedureofAKCleanerintroductionIVOInfoVision2020/5/13AirKnifeCleanerintroductionIVOInfoVision2020/5/13CoaterintroductionIVOInfoVision2020/5/13CoaterintroductionDehydrationbakeIVOInfoVision2020/5/13DehydrationbakeCoaterintroductionIVOInfoVision2020/5/13•Purpose:ToIncreasetheAdhesionofPhotoresist•Adhesion:HMDS(Hexamethyldisilazane);[(CH3)3Si]2NH•Keyparameter:–AdhesionMethod–AdhesionTime–Temperature–Exhaust•Function:–Si-O-H----OH2+[(CH3)3Si2NHSi-O-Si-(CH3)3PhotoProcess-AdhesionCoaterintroductionIVOInfoVision2020/5/13PhotoProcess-AdhesionCoaterintroductionIVOInfoVision2020/5/13•Resist:–树脂（20%）–感光剂(PAC)（5%）–溶剂（75%）–添加剂PhotoProcess-CoatingCoaterintroductionIVOInfoVision2020/5/13目的1.将MASK上的图案转移到胶中2.在后续工艺中保护下面的材料CoaterintroductionIVOInfoVision2020/5/13ExposureLightPositiveTypeNegativeTypeDevelopingResistThinFilmSubstrateMaskChrome正光阻：曝光后，光照到部分显影后去除负光阻：曝光后，光照到部分显影后保留CoaterintroductionIVOInfoVision2020/5/13树脂惰性的聚合物（包括碳、氢、氧的有机高分子）基质，用于把PR中的不同材料聚在一起的黏合剂。给予PR的机械和化学性质（黏附性、柔顺性、热稳定性）感光剂PR内的光敏成分，对光形式的辐射能，特别是紫外区，会发生光化学反映。CoaterintroductionIVOInfoVision2020/5/13溶剂使PR保持液体状态，对PR的化学性质几乎没有影响添加剂专有化学品，用来控制和改变PR材料的特定化学性质或光响应特性，包括控制PR反射率的染色剂CoaterintroductionIVOInfoVision2020/5/13PR的物理特性•分辨率•对比度•敏感度•粘滞性•黏附性•抗蚀性•表面张力•存储和传送•沾污和颗粒CoaterintroductionIVOInfoVision2020/5/13分辨率•能够在玻璃基板上形成符合要求的最小的特征图形。形成的CD越小，PR的分辨能力和光刻系统就越好CoaterintroductionIVOInfoVision2020/5/13对比度•PR从曝光区域到非曝光区域的过度的陡度对比度差对比度好FilmGlassPRFilmGlassPRCoaterintroductionIVOInfoVision2020/5/13敏感度•PR产生良好图形所需要的一定波长的最小能量值（MJ/C㎡），对于一定的曝光能量，PR的吸收量越大越好CoaterintroductionIVOInfoVision2020/5/13粘滞性•粘滞性与时间有关，会随着PR溶剂的挥发增加。粘滞性增加，PR流动趋势变小，厚度会增加。CoaterintroductionIVOInfoVision2020/5/13粘附性•PR与下层材料黏附之强度。如黏附性不好，会导致表面图形的变形。CoaterintroductionIVOInfoVision2020/5/13抗蚀性•PR必须保持黏附性，并在蚀刻工艺中保护下层材料。如在高温下进行处理，还需要有热稳定性。CoaterintroductionIVOInfoVision2020/5/13表面张力•液体中将表面分子拉向液体主体内的分子间吸引力。CoaterintroductionIVOInfoVision2020/5/13沾污和颗粒•在PR涂布之前，要使用Filter，使沾污控制在最小程度CoaterintroductionIVOInfoVision2020/5/13SpinCoatingSlit+SpinCoatingslitCoaterCoatingMethodsCoaterintroductionIVOInfoVision2020/5/13SlitCoatingCoaterintroductionIVOInfoVision2020/5/13ExposureIntroductionIVOInfoVision2020/5/13LocationsofUnitsMaskPellicleParticleCheckerMaskChangerMaskCassetteConsoleBoxPlateControlBoxMercuryLampMainBodyExposureIntroductionIVOInfoVision2020/5/13LayoutExposureIntroductionIVOInfoVision2020/5/13•亮场掩膜版•暗场掩膜版MASK（掩膜版）分类ExposureIntroductionIVOInfoVision2020/5/13材料•石英：高光学透射和低温度膨胀。•铬：沉积在掩膜版上的不透明材料。有时会在铬表面形成一层氧化铬抗反射层。ExposureIntroductionIVOInfoVision2020/5/13OperationModeoftheConsole•InlinemodeCommunicationbetweenMPAandI/FPlateisloadedbyI/Farm•StandalonemodeNocommunicationbetweenMPAandI/FPlateisloadedbyHand•ConsoleMode(nouse)NocommunicationbetweenMPAandConsoleExposureIntroductionIVOInfoVision2020/5/13UM06System光罩只在Y方向移动玻璃基板可在XY方向移动梯形镜凹面镜凸面镜ExposureIntroductionIVOInfoVision2020/5/13Resolutionvs.WavelengthR:resolution(minimallinewidth)K:constantλ:wavelengthNA:numericalapertureNAKRResolutionofExposureMachineTFT-LCDexposureequipmentResolution~3umExposureIntroductionIVOInfoVision2020/5/13IlluminationSystem光源：8千瓦超高压水银灯，2只Lamp：Standardtype--750小时，Longtype--1000小时波长：exposure----340nm~460nm[g/h/iline，436nm/405nm/365nm]alignment---536nm~600nm[d/eline，578nm/546nm]强度：可见光波长范围（nm）紅外輻射紫外輻射700500600400ExposureIntroductionIVOInfoVision2020/5/13Mask/PlateAAAA：AutoAlignment自动对准，分为预对准(Pre)和精对准(Fine)两种对准：maskaligntomaskstage，platealigntomask光罩对准：maskFMAmark---stagesetmark基板对准：platealignmentmark---maskTV-pre/finemarkExposureIntroductionIVOInfoVision2020/5/13MaskStage架構說明•Mask放到maskstage後,先由CCD(3.85X)做maskpre-alignment,接著做maskfinealignment(由maskalignmentmark去對準maskstage上的setmark—此動作由X/Y/Thetastage完成),完成以上動作後,maskstage上的LockPads