含氟特种气体及电子化学品市场与竞争力分析

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2010176ChemicalProductionandTechnology()(,300131)、、,、、,、,。、、、、。;;;TQ124.3CDOI10.3969/j.issn.1006-6829.2010.06.001:2010-10-13!!!!!!!!!!!!!!,,,,、、。,、、。()、(SF6)、(WF6)。,SF6,、、(CF4)、(NF3)。,(CVD)(PVD),。、、。4,。(HF)、(KHF2)、(KF)、(NH4HF2)。。1(F2)100,,,60。,;,。,(),。,。1.1,,144K、5.5MPa-。,、、,、。,,、、,。,,,(),(<78℃),。,OF3,,(SiF4)。。,,,、;,,,,·1·。、、,ClF3、ClF5、BrF3、BrF5、IF5IF7,ClF3,IF5。,S2F2、S2F10、SF4,300℃SF6。HF、OF2O2,(5%),OF2,,,。,,(、、),,,,“”,“”。,(、)“”。:、,,,,。,,、,,。1.2,。,CVD,,、、。、,。,,,,,,,、,。(UF6)、SF6、、、,。:,NF3、(PF3)、(BF3)、CF4SiF4,。:、、、,。90℃1%5-。α,。、(UF6)、、。,,。1.3HF(AHF)。AHF,,KHF2HF(n(KF):n(HF)=1:3),100℃。。1)。HF,,、,。:KF·3HF→F2+H2+KHF2。2)。,,。2。①K2MnF6(5%KF)SbF5:KMnO4+2KF+3H2O→K2MnF6+8H2O+3O2,SbCl5+5HF→SbF5+5HCl;②。PTFE,130℃1h:2K2MnF6+2SbF5→4KSbF6+2MnF3+F2。1.4,HF(HF2)。,。、,,。HF,,HF。,,()·2·2010176ChemicalProductionandTechnology。,、,30℃,、。、。2SF62.1SF6、、,、、,-51℃,1.67(-100℃),146.06,(=1)5.11。SF6,。500℃。,、,。,500℃。SF6,。2.5、2.5,100。,SF62。SF6,,,,。2.2SF6、,3,、、、、、X、、。SF6,,。SF6,。SF6,SF6,,SF6。2.31900,MoissonLebeauSF6,SF62。2.3.1SF6,120~180℃。,,,。SF6。SF6,SF4,O2HF,、、,。,。2.3.2SF6,SF6,。,。AHF()、、SF6。HF,SF4。、,SF6,,SF6。,SF4,F2。AHF、AHF、。,,,,,。2.3.3SF6。、,400℃、0.1MPa,2~8h。,SF6。2.3.4,SF6,,。1)。SF650%,NaOH、KOH、NaClOCa(OH)2。,。2)。SF6·3·,。,,。,;,SF6。3)。SF6。2.3.5,SF6,,。,,SF6。,,,,。:,。SF6、、HF,、,。,。2.470,SF63.5kt/a。,SF6,2004,。:SF6;SF6,,SF6,SF6。SF6,,。SF610,、、、5200~250t。,SF6,300t/a。2005、20082kt2.8kt。SF6《》6,、、,。2005SF613kt。,5、、、()7%、7%、5%、15%,8%,2010SF620kt。1SF6,3.6kt/a,1/30;2;3,1.4kt/a,1.5kt/a;4,1.2kt/a;5(),1.1kt/a。2005SF64kt/a,20078.2kt/a,1。2005SF62.5kt,20%,2006,SF6。12007SF6Tab1SinoSF6productivecapacityofsomewanufacturersin2007SF6,,SF6,SF6。2008—20105kt。,SF6,,SF6。1SF6,8700,1.2kt/a,1.5,1.8kt/a;1.5,,1.5kt/aSF6,600t/a20075。SF6(99.99%),,。49,59。SF6,SF6NF3/(ta-1) 300014001000 1000 1600 1200 5041500! 1200#$%& 1200’()*+ 1100,-8200()·4·2010176ChemicalProductionandTechnology,,SF6CVDNF3。CVD,,。,20102,500。SF630,SF6150t,2010400t,2030SF6。SF6,SF6。、,、,。,SF6,(GB12022—89)(IEC376-71)。SF6,,SF6,SF6,,,。,SF6,,。33.1WF6,,。17.5℃,2.3℃,3.44(15℃);,H2[WF8]。WF6,CVD;WSi2(LSI)。CVD,X。、、、。WF6,CVD。,。WF6NF3,。,。WF6,,-80℃WF6,(-10~10℃),WF6。,WF6CVD,、,Xγ,。3.2NF3WF6,350℃。,。3.2.1WF6,:W+3F2→WF6。。,。,WF6。3.2.2NF31NF3WF6,:W+2NF3→WF6+N2。NF3HF,Na2S2O3NO,。WF6,、HF、SF6、NF3、CF4、CO2、N2、Ar。WF6,。WF6,。HF、MoF6、CrF4。CVDWF6,,0.5×10-3,5×10-6。WF6。3.2.31WF6。2,3:·5·1)WF6,5×10-9;2)WF620cm3/sNaFKF。HF5×10-6,SF40.5×10-6;3)WF63℃。HeWF6,3℃,138~207MPa。。He,,。,22。1,1;11。3.3WF6,(AirProducts,AP)、Praxair、Bandgap、Metheson,、、。WF6,1/2。APBandgap2,90。PraxairWF6,WF699.9999%,40t/a。2005WF61.3kt/a,1kt/a。90,,2005225×109m3,240。90WF6,,KDK19983,、。AP19992HometownWF61,63.5t/a;20021WF6,45.4t/a。2002WF650%150t/a。PlaXair(ARC)WF6,,。WF6,,。,WF6,。,WF6。,“”,200,、。3.4,;,WF6;、、、。44.1(IF5),。9.43℃,100.5℃,3.19(25℃),1333Pa。,,。4.2IF5,,IF5。、、,,。,CF3(CF2)nI(n,1~10),。C2F5I,TFE,。,、、、。。,Rf—,。RfCH2CH2I,,,。,()·6·2010176ChemicalProductionandTechnology、、、。4.3、、,,。4.3.1IF5,:I2+5F2→2IF5。2。1)。。60,-60~80℃IF5。。,,,IF5,。,,。,,,,。,。2)。2。114℃,,,。,,,。,,。,IF5,I2,。IF5I25%~10%,,,。4.3.2,,,IF5。,,IF5,,IF5。4.3.3AgFI2,,IF5,,,。4.3.4(KIO3)SF4IF5KIF6。60℃2h,120℃2h,140℃4h,240℃6h。,-78℃,,IF5。KIO3,。4.3.5(I2O5)-,133Pa,SF4,,,4.3.4,IF5。,IF5,。4.3.14.3.2,,。,,,IF5。4.4、、、。IF5ABCRGmBRCo、AP、、。20046kt,600t。,,,IF5,、,。,。:、、(504)。·7·2010,17(5)ChemicalProductionandTechnologyABSTRACTSCompetitiveStrengthandMarketAnalysisofElectronicChemicalsandSpecialGasContainingFluorine(tobecontinued)ChenHongchang(ChinaInorganicFluorideAssociation,Tianjin,300131)Abstract:Thehigh-endinorganicfluoridewhichincludingfluorine-containingspecialgasandelectronicchemicals,sulfurhexafluoride,tungstenhexafluorideandIodinepentafluoridewereintroducedinthispaper.Theseproductsmainlyappliedinthefieldofhigh-techcontainingelectronic,newmaterialandaerospaceandgenerallycharacterizedbyhightechnicalcontent,highadditionalvalueandoccupiedanimportantplaceinthenationaleconomy.Besides,otherinformationincludingtheproductionpropertiesandproductionmethods,thesituationandmanufacturemessagesalsoreviewedinthepaper.Keywords:specialgascontainingfluorine;electronicchemicalscontainingfluorine;high-end;competitivestrengthTheSituationandDevelopmentTendencyofHydrogenFluorideinChinaXuJianguo,ZhouZhenfeng,YingShengrong(QuzhouDingshenChemistryScientificCo,Ltd.,Quzhou,Zhejiang324000)Abstract:ByintroducethemethodofdevelopmentofproducingmethodsofHFandthecurrentrequirementofthemarket,thepaperanalysisthefuturetendencyofHFandputemphasisonpreparationHFbyfluosilicateacid.ThepaperalsorisetheopinionthattheeffectivelyresolvedoffluorinechemicalindustrystrategicallyimportantforSinoHFdevelopment.Keywords:hydrogenfluoride;fluosilicateacid;fluorite;vitriol;situation;developmentElectrofluorinationandItsFine-fluorineProductionBranches(theend)HuangChenghua,LiXunsheng,JinGuangquan(HubeiZhongkeBoceNewMaterialinstitute,Wuhan430015)Abstract:ThedevelopmenttendencyandtechnologyneedingwhileusingElectrofluorinationmethodtopreparefine-fluorinechemicalsisreviewedinthepaper.Aftertheaboveanalyzation,theauthorrisethedevelopmentstrategyaimoffine-fluorinechemicalsintermsofoperatingmech

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