ASML-光刻机介绍

SMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoASMLScannerGeneralIntroductionSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoCourseOverview•SystemOverview•BasicOperation•RecoverySMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•PAS5500WAFERSCANNEROVERVIEW•PurposeThePAS5500isafullyautomaticstep-and-repeatcameraforexposingwafersusedformanufacturingofintegratedcircuits.Thesystemformspartofalithographicprocess,andissuitableforbatchproductionoflargeandverylargescaleintegratedcircuits.SystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoThePAS5500waferscannercomprisesthefollowingmainunits:•Exposureunit,•Wafertransportsystem,•Operatorconsole,•Electronicscabinet,•ContaminationandTemperature(C&T)cabinet.SystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSAFETYOVERVIEWOFPOTENTIALHAZARDSThemainhazardsrelatedtothePAS5500/500,/550,/700are:•Laserradiation,includinghighintensitydeepultraviolet(DUV)laserradiationof248nm•Lasergases,includingvery-toxicfluorine•Mechanicalmovements.•Otherhazardsare:•Magneticfields•RemotecontroloftheunitusingtheRemoteMonitoringandControlSystem(RMCS)SystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSystemOverviewSYMBOLSSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSYSTEMBUILDUP•ThemainunitsofthePAS5500canbefurtherdividedintothefollowingsubsystems:•AM(AirMount)•ARMS(AdvancedReticleManagementSystem)•IRIS(IntegratedReticleInspectionSystem)•WH(WaferHandling)•LS(LevelSensor)•SWS(ScanningWaferStage)•SRS(ScanningReticleStage)•AL(Alignment)•IS(ImageSensor)•IP&IL(IlluminationandProjection)•OA(Off-Axisillumination,ATHENA)•CT(ContaminationandTemperaturecontrol)SystemOverviewSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•AirmountSeparatingmachineintotwoparts:SilentWorldandExternalWorld•Purpose:VibrationIsolationPositionControlDiagnosticToolSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•Advancedreticlemanagementsystem(ARMS)PurposeThepurposeoftheARMS,istoprovideameansofautomaticallyretrievingandplacingthedesiredreticleaccuratelyonthereticletable.Toaccomplishthisthesystemmust:1.ControltheStandardMechanicalInterFace(SMIF)port,2.Identifythereticles,3.Loadandunloadreticlesto/fromthelibrary,4.Prealignthereticleonthereticletable,5.Placeandremovethereticleonthereticletable,6.Importtherelativemachineconstantsandlayoutdata(ifavailable)Sub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•WAFERHANDLING•PurposeTheWHsystemhastwoprimaryfunctions.Itsfirstmaintaskistotransportwafersbetweenacarrier(orapedestal)andtheprealignmentsystem,thistaskisperformedbytheWaferTransportSystem(WTS).Itssecondmaintaskistoprealignawaferthathascomefromthewafertransportsystem,sothatitcanbeacceptedbythewaferstage.ThisisaccomplishedbytheWaferPrealignmentSystem(WPS).Sub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•LEVELSENSOR•PurposeThePAS5500projectsreticleimagesontowafersatanextremelyhighresolution.Highresolutioncanonlybeachievedwhenthewaferisaccuratelypositionedintheoptimumfocalplane.TheUsableDepthOfFocus(UDOF),thatistherangeinwhichimagescanbesharplyreproduced,isonlyafewmicrometres.Whenusingextremelyfineresolution,itcanbeaslowasonemicrometre.•Thepurposeofthelevelsensorsubsystemisto:1.Determinethedistancebetweenthewafersurfaceandthebottomsurfaceoftheprojectionlens,2.Controlthewaferstagelevelactuatorstobringthewafersurfaceintothedesiredoptimumimageplane.Sub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•ALIGNMENT•PurposeThefunctionofthealignmentsystemistoalignthewafertothereticleonthereticletable.Thespecificationiscriticalbecauseawafercanbeexposedupto30times,sogoodoverlayaccuracyisrequired.Sub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•ILLUMINATIONANDPROJECTION•PurposeThepurposeoftheilluminationsystemistoexposethereticleimagethroughtheprojectionlensontothewafer.Theilluminationsystemcreatesalightbeamofhighintensityandevenuniformity,atreticlelevel,whichhastheproperspectralcomposition.Sub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoSub-ModulesSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoBasicOperationUnixSystem/PASSoftwareSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoBasicOperation•PASSoftware•PASSoftwareisanapplicationsoftwareunderSolarisSys,whichisakindofUnixsystem.•Inmostcases,weoperatethemachinewithPASSoftware,butsometimesweneedtotypecommandsincommandwindowforlowlevelfunctions.SMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/PhotoBasicOperationSMICSMICSECURITY3SMIC-INTERNAL5/28/2020Eng-3/Photo•MainMenuBasicOperationSMICSMICSECURITY