ZrO2薄膜分析

19LoeffenW,MullenderS,GoulonJ,etal.J.Phys.IV7p.333,1997.20.[D],p.383-384,1984.21SS.[D]p.213-219,1990.Designandfabricationofthex-raysupermirrorWANGFengli,ZHANGZhong,WUWenjun,QINShuji,WANGZhanshan,CHENLingyan(Departmentofphysics,InstituteofPrecisionOpticalEngineering,TongjiUniversity,shanghai200092,China)Abstract:thedesignandthefabricationofx-raysupermirrorhavebeenproposed,whichisusedasthehighmirrorinx-rayimagingtelescope.First,thecoatingmaterialspairW,CisselectedbythecombinationoftheSpiller’andYamamoto’criterion.Thenusingtherelationofthepeakingreflectivityofperiodmultilayerandthebilayernumbers,thetotallayernumberisdeterminedandatthesametimethefirstcoatingstructureisgivenbythewayofYamshita.Andthentheoptimizationofthemultilayerhasbeenachievedbyusingthealgorithmofsimplexoptimization.Theflatreflectivityofbroadbandsupermirroris21%inthewavelengthbandof0.0475~0.0886nmatthegrazingincidentangleof8.7mrad.Theinfluenceoftheroughnessandtheinterdiffusionbetweenthedifferentlayermaterialsonthereflectivityofmultiplayerissimplyintroduced.Finallythedesignedmultilayerstructurehasbeenfabricatedonthemagnetronsputteringsystem,andthemeasuredreflectivityisaround15%intherangeof8.7-15.7mradbythex-rayreflectivitydiffractometer(XRD).Keywords:broadbandsupermirror,simplexoptimization,roughness,magnetronsputteringZrO2X∗201800215006X-raydiffractionanalysisoftheZrO2filmsZhang-DongpingShao-ShuyingHong-RuijinShao-JiandaFan-Zhengxiu(Research&developmentcenterforopticalcoatingfilms,ShanghaiInstituteofopticsandfinemechanics,ChineseScienceAcademy,Shanghai,China,201800)∗863E-mail:[e-mail]44Wang-Wenbao(Testing&AnalysisCenter,SuzhouUniversity,Suzhou215006)ZrO2filmsweredepositedbyelectronbeamevaporationmethod.TheXRDanalysisresultsshowedthatthestructureandcharactersofthefilmsaredifferentwithdifferentelectronbeamdensityduringdeposition.Thefilmwasinamorphousstateunder100mAelectronbeamcurrentintensity.Whenelectronbeamcurrentintensitywas120mA,crystallizationbecomeappearance,andthecrystallizationandcharacterpeakbecomestronger,andtheFWHM(FullWidthatHalfMaximum)becomenarrower,thecrystalsizesandsurfaceroughnessbecomebigger.Internalstressalsochangedwiththeelectronbeamcurrentintensity,buttherelationsarenonlinear.Thestressesinthefilmsaretensileunder140mAelectronbeamcurrentintensity,thevaluewasverysmallandapproachzero;butunderotherelectronbeamcurrentintensity,thestressesappearscompressive.Keywords:X-raydiffraction,stress,surfaceroughness,crystalsizeZrO2SiO2[1,2]ZrO2David.RKeneth.JZrO2[3]Hyun.J.CChang.K.HZrO2[4]XZrO2ZrO22.1201mmK95020202.2ZZSX-800F3002400nm1/2ZrO2410-3Pa8mm()2.3VeecoWYKONT-1100RIGAKU/MAX-3CXCuK0.15406nm45203040506070809002004006008001000intensity2θ/degree100mA203040506070809002004006008001000intensity2θ/degree160mATetragonal(111)Monoclinic(-112)Monoclinic(302)203040506070809002004006008001000intensity2θ/degree120mATetragonal(111)monoclinic(-112)monoclinic(302)203040506070809002004006008001000intensity2θ/degree140mATetragonal(111)Monoclinic(-112)Monoclinic(302)1XFigure1XRDspectraofthesamples11002285Y2O3CeO2[5]1X100mA120mA140mA160mAd111PDFzdd0/d01dd0E/2z2E135.24GPa0.36[6]Scherrer[7]L=cos/3460.9K0.15405nm2323120mA160mA140mA120130140150160-1.0-0.8-0.6-0.4-0.20.00.2internalstress/GpaIm/mA1201301401501600.120.130.140.150.160.170.180.19L/nmIm/mA23Figure.2RelationsbetweentheinternalstressesandtheelectroncurrentintensityFigure.3Relationsbetweenthecrystallitesizeandtheelectroncurrentintensity474120mA100mA120mA120mA3X4120mA160mA5X7[8][9]KlingerCarniglia[10][11]1001101201301401501600102030405060roughness/nmIm/mA102030405060708090-2000020004000600080001000012000140001600018000intensity2θ/degree45XFigure4SurfaceroughnessandtheelectroncurrentintensityFigure5XRDspectrumofthebulkZrO2ZrO2X1.ZrO22.120mAZrO2120mAE-mail:[e-mail]