5-金刚石颗粒表面均匀电镀工艺研究

整理文档很辛苦,赏杯茶钱您下走!

免费阅读已结束,点击下载阅读编辑剩下 ...

阅读已结束,您可以下载文档离线阅读编辑

资源描述

40,,,,(,610065)[]介绍在金刚石颗粒表面均匀电镀金属的工艺以镀镍为例研究金刚石表面化学镀电镀的工艺设计了一种新型多用途金刚石表面电镀的装置用此装置也可在其他导电或者不导电的小颗粒表面电镀或者复合镀金属在金刚石表面化学镀上一层导电的金属以后,再以滚镀的方式将电镀层加厚,可获得厚度在10~200m的均匀金属镀层同时还介绍了电镀后金刚石表面镀膜厚度的计算方法和电镀过程中要注意的一些问题,并简介了补镀的工艺和方法[]金刚石;电镀;化学镀;均匀电镀[]TQ153[]A[]1001-3660(2006)01-0040-04WellproportionedElectrodepositiononDiamondGrainsCHENChao,PENGFang,ZHANGMeiguang,SUNGang,WANGJianghua(InstituteofAtomicandMolecularPhysics,SichuanUniversity,Chengdu610065,China)[Abstract]Wellproportionedmetalelectrodepositionondiamondgrainswasintroducted.TakingNiasaexample,relatedmethodofelectrolessplatingandelectroplatingwasintroduced.Anewmultipurposedevicewhichisuseforelectroplatingondiamondwasdesigned.Theequipmentcanbeusetoelectroplatemetalorcompositeelectroplatemetalonsmallmetalornonmetalgrains.Afterchemicalplatingaconductivemetalondiamond,thethicknessofmetalcoatingwasincreasedbyrollercoatingprocess.Besides,thecalculationmethodofthethicknessofthecoatingandsomethingthatweshouldcareaboutandthecraftandthemethodthatrepairtoplatewereintroduced.[Keywords]Diamond;Electroplating;chemicalplating;Wellproportioriedelectrodeposition0[]2005-11-12[](1980-),,,,:,,,,,,,,,,,,,10~200m,,,1,1,:40~45,2,,:/2(1/2)(2/n),n,411:1),2,;2)/2,;3)/2,,2,,,,,,,[1],,4,,,,,,,,[2]22.1,Ni:Ni[3]2.1.11),10%NaOH,30min,2~3,2)HNO320min,2~33)10g/LSnCl22H2O,20ml/LHC,l3~5min4)0.5g/LPdCl2,10ml/LHCl,4min5)30g/LNaH2PO22H2O,3min,,[4]2.1.2Ni:30g/LNiSO46H2O(,,20g/L,,30g/L,,,)30g/LNaH2PO22H2O(,,,,,,30g/L,,)[5]25g/L10g/LpH4.8~5.2(883),2.2111234NiSO47H2O/(gL-1)120~140150~250250~300250NiCl26H2O/(gL-1)30~60NaCl/(gL-1)7~98~105H3BO3/(gL-1)30~4030~3535~4030Na2SO4/(gL-1)50~8020~30MgSO47H2O/(gL-1)30~4050NaF/(gL-1)430%H2O2/(mgL-1)0.1C12H25SO4Na0.01~0.020.05~0.1pH5.0~5.65.0~5.53~44.0~4.5/30~3520~3545~6045~50DK/(Adm-2)0.8~1.50.8~1.51.0~2.51.0~1.5:1,;2;3;4351Vo.l35NO.120062SURFACETECHNOLOGYFeb.2006421,4,2.3,,,,,,,,,,,,,,5~15r/min,,,,,,,,,,,(3a),,(3b),,,3b,(3c),,(3d),,[6]3,,2.44,,,,,,52.5300,,R1,V1,1,R2,V2,M1,45m1=M1/300(4/3R31)=m:R1=[(3m1)/(41)]1/3,M2,m2=M2/300m=m2-m1,m,V,Ni2,V=m/2V1+V=V2,V=4/3R32R2=[(3V2)/(4)]1/3:R=R2-R1=[(3V2)/(4)]1/3-[3m1/(41)]1/3=[3(V1+V)/(4)]1/3-[3/4m1/(1)]1/3=[3(m1/1+m/2)/(4)]1/3-[3/4m1/(1)]1/3[7][8]2.6,Ni,Ni,Ni,N,i,,,Ni,Ni,Ni,Ni,,,,,,Ni,4331),,,,,,,,,,,2),,3),,,4,,,,,,,,,CuMoCrTiFeZn[][1],,.[J].,1997,22(1):104106[2],,.[J].,1996,(2):3134[3],,.[J].,2005,(4):1820[4],,,.[J].,1997,16(1):2730[5].[J].,2003,32(3):2527[6],.[J].,1996,2(32):5154[7]ZhitomirskyI.Cathodicelectrophoreticdepositionofdiamondparticles[J].MaterialsLetters37,1998,7278[8]LeeWunhsing,TangSencheh,ChungKungcheng.Effectsofdirectcurrentandpulseplatingonthecodepositionofnickelandnanometerdiamondpowder[J].SurfaceandCoatingsTechnology,1999,120-121,607611(上接第11页)[23],,,.TiO2-xNx[J].,2004,18(1):108112[24],.TiO2[J].,2003,4(2):4448[25],,.[J].,1997,5(3):110[26],,,.CdSTiO2[J].,200,l20(3):157160[27]KangMG,HanHE,KimKJ.Enhancedphotodecompositionof4chlorophenolinaqueoussolutionbydepositionofCdSonTiO2[J].JournalofPhotochemistryandPhotobiologyA:Chemistry,1999,125:119125[28],,,.Sr[J].,2002,8(1):2326(上接第24页)[2]KimHyungjun,YoonByounghyun,LeeChanghee.SlidingwearperformanceinmoltenZnAlbathofcobaltbasedoverlayersproducedbyplasmatransferredarcweldsurfacing[J].Wear,2003,(254):408414[3]SongJinhwa,KimHyungjun.SlidingwearperformanceofCobaltbasedalloysinmoltenAladdedzincbath[J].Wear,1997,(210):291298[4]zhangK.Wearofcobaltbasedalloysslidinginmoltenzinc[J].Wear,2003,(255):545555[5].[J].,1997,(5):3235[6].[J].,1995,(5):3540[7],.[J].,2001,30(5):.7984[8],.[J].,1998,(4):1226[9].[M].:,1998.248249[10],,.Al2O3[J].,2002,31(4):1520[11],.[J].,2003,25(2):98104351Vo.l35NO.120062SURFACETECHNOLOGYFeb.2006

1 / 4
下载文档,编辑使用

©2015-2020 m.777doc.com 三七文档.

备案号:鲁ICP备2024069028号-1 客服联系 QQ:2149211541

×
保存成功