电镀废水处理站DTCR辅助氢氧化物沉淀工艺改造

54Vol37No62011DTCR王本洋简丽(,100120)某废水处理站改造前采用传统氢氧化物沉淀工艺处理高浓度含铬氰镉电镀废水,运行不稳定,出水不能达标排放工艺改造后增加了高分子重金属捕集沉淀剂DTCR辅助去除重金属,在含铬废水DTCR投加量为50mg/L含氰镉废水DTCR投加量为10mg/L条件下,出水总铬镉分别稳定在0.5mg/L0.2mg/L以下,远低于电镀污染物排放标准(GB219002008)限值电镀废水DTCR沉淀重金属铬氰镉ImprovementoftheDTCRassistanthydroxideprecipitationprocessinelectroplatingwastewatertreatmentstationWangBenyang,JianLi(SecondDesignandResearchInstitute,ChinaAviationPlanningandConstructionDevelopmentCo.,Ltd.,Beijing100120,China)Abstract:Beforereconstructionproject,somewastewatertreatmentstationusedthetradition-alhydroxideprecipitationprocesstotreatelectroplatingwastewaterwhichcontaininghighconcen-trationchromiumandcadmiumcyanide,butthetreatmenteffectwasnotstableandeffluentcouldnotmeetthedischargestandards.Afterimprovement,thepolymerheavymetalchelatingagentDTCRwasusedtohelpheavymetalremoval.WhentheDTCRdosageforchromiumwastewaterandcadmiumcyanidewastewaterwere50mg/Land10mg/Lrespectively,thetotalchromium,cadmiumineffluentwerestabilizedbelow0.5mg/Land0.2mg/Lrespectively,whichwasfarbe-lowthestandardsofEmissionstandardofpollutantsforelectroplating(GB219002008).Keywords:Electroplatingwastewater;DTCR;Precipitation;Heavymetal;Chromium;Cad-miumcyanide2001,(GB89781996),,[1,2]200881(GB219002008),,11.1,8h,400m3/d11/m3/h15Cr6+60~100mg/L,pH4~510CN-10~30mg/L,Cd2+2~4mg/L,pH8~918pH4~615pH8~91.2,Vol37No62011551pH2~2.5Na2S2O5,Cr6+Cr3+,pH8.5~9,;NaClO,pH10~11CN-CNO-,,pH11.5~12Cd2+,11.3(1)1,,,4m5m4m,HRT4.5h2(11),15m3/h,12m(2)1,PVC,3m1.5m1.8m,2,HRT30min(3)1,,PVC,2m1.5m1.5m,HRT15min(4)1,,,HRT1h,0.4MPa,35%(5)2,,,1.5m3.5m,10m/h(6)1,,,3m5m4m,HRT5h2(11),10m3/h,12m(7)1,,PVC,3m1.5m1.8m,2,HRT40min(8)1,PVC,2m1m1.5m,HRT15min(9)1,,,HRT1h,0.4MPa,35%(10)2,,,1.2m3m,10m/h1.4,Cr6+50mg/L,Cd2+1mg/L,(GB89781996)2005,,Cr6+100mg/L,Cd2+4mg/L,200881(GB219002008),GB897819961.5mg/L1mg/L,0.1mg/L0.05mg/L,2280m2,,,,,[3~5](DTCR1)DTCR,,,(TDC)15min,1,15min;pH,NaOHpH,DTCRPACPAM3,Cr6+80~100mg/L,Cd2+3~4mg/L,2mg/L,0.08mg/LDTCR,,(GB219002008)56Vol37No620113.1pHDTCRDTCRpH5~13,pHpH,,pH;pHDTCR,DTCRpH3.1.1pHDTCR2,,pH8.5~9,2mg/L,;pH9,Cr(OH)3,DTCR,DTCR40mg/L,pH6~10,DTCR;pH7~9,pH,0.75mg/LDTCR,DTCR,DTCR;pH7~7.5DTCR,,DTCR2pHDTCR3.1.2pHDTCR3,,pH11.5,0.1mg/L;pH,,0.08mg/L,DTCR,pH11,5mg/LDTCR,0.05mg/L,3.2DTCR3.2.1DTCRpH7~7.5DTCR,3pHDTCRDTCR40~40mg/L,DTCR;,,50mg/L,0.5mg/L,GB219002008DTCR,0.2mg/L,,DTCR4DTCR3.2.2DTCRpH11~11.5DTCR,DTCR510mg/L,0.02mg/L4,pH7~8DTCR50mg/L;pH11~12DTCR10mg/L,Vol37No62011575DTCR2GB219002008/mg/L60~1002~40.3~0.51/mg/L2~40.08~0.100~0.020.05,27.8,0.8,7,3.5/m32.9/m3DTCR,4.2/m33.1/m30.7/m30.2/m3,,5(1),DTCR,,(2)DTCR,pH,(3),DTCR50mg/L,0.5mg/L;,DTCR10mg/L,0.02mg/L,GB219002008参考文献1,..:,20002,,,..,2003,23(4):33~353..,2005,6(9):83~854,,,.DTC(EDA).,2006,25(6):765~7675,,.DTCRCr3+,Cu2+,Ni2+.,2008,36(3):68~71:10012012:[phone]Email:[e-mail]:2011-01-05:2011-03-30创新理念让科技发挥效益,,1957,,,,,,,5~6h,,,,,+,,,,50%,,,,,2010,5(),,36000m3/d,,(通讯员张志军)