电镀废水处理站总体设计要点

3,(4-6-501,210013):,,:;;:TQ153;X703:B:1004-227X(2003)05-0045-04GeneraldesignofwastewatertreatmentstationforelectroplatingsectorCHURong2bang,CHUChun2juan(No4-6-501,HujuBeiRd,Nanjin210013,China)Abstract:Improvementsofrinsemethodandelectroplatingprocesswereadoptedtoreducequantityofwasterwateranddecreaseconcentrationsoftoxiccomponentsinwastewater.Basisandcontentongeneraldesignofwastewatertreat2mentstationweredescribedindetail.Keywords:electroplating;wastewatertreatment;design1,,,,(),,,:,2,,,,,,,,,95%;;,:2003-04-14:2003-07-043,,,,,23,,,,,,,,,,,3,54225200310Electroplating&FinishingVol.22No.5Oct.2003©1995-2006TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.,,,,,,,,,;,,,,,,4,,,,,,,,:,,;,,,:,,,pH,,(:),5511()51251211:(),51212,,:,51213,51214,51215,,(),,,,:,,,,,,:,,,,,,64200310Electroplating&Finishing5©1995-2006TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.,;,,2,,,,,,,,512165121611:,5121612,/[3],1115m/s,015115m/s,110m/s5121613,,,,,,,,(1%5%),,(),90,,;,,,,51217,,,,,,,,,,,,,,,,51218,51219,,,,512110(),35mm,202203,,512111,:1);2);3);4);5);6)51211274©1995-2006TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.()512113512114,,513,,,,,,,,,pH23,,Cr6+1632Cr6+Cr3+,pH237715,pH5,,pH7715,,,,,,,,,,,,,,,,,,,(),,,,,,,,,,,,,,,,6,,,,,,,,,,,,,,,,[],,:[1].[M].:,1984.[2][M].:,1985.[3].[M].:,2000.719-750.[:]84200310Electroplating&Finishing5©1995-2006TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.