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工业用水中硅化合物的去除方法邵磊,宋存义,胡永平,卢寿慈(北京科技大学资源工程学院,北京100083):根据工业用水对于水质中硅含量的要求,介绍了混凝反渗透超滤微泡浮选电凝聚离子交换脱硅和阻垢剂抑制硅垢等方法的应用效果和各种技术的新进展:工业用水;硅化合物;脱除:X703:B:1000-4602(2000)04-0026-03,,,;,,[1];,,;,;,,1混凝脱硅,+60%,+90%[2]111,[3]:¹pH:pH10.1~10.3pH,pH,º:,,,0.2~0.35mmol/L»:,40e1mg/L¼:30e,1h,40e1h,120e20~30min½:(mg-MgO/mgSiO2-3),,5~20112[4]:¹:20eº:30min,»pH:pH8~9¼:,,,:AlO(OH)Al2O3#3H2OAl(OH)3pH4.1~4.7,40mol1mol113,pH9,#26#2000Vol.16CHINAWATER&WASTEWATERNo.41mg10~20mg,,3~5mg/L,20mg/L,70%~80%114,40e,,30%~35%[5]110~115e,CaSiO3,80%,,,,,,,,2反渗透脱硅Buecker[6],,,[7],93%,SiO280%,5~20mg/L,,1mg/L80,,,3超滤脱除胶体硅,,,KunKunin,,100nm,7@104~7@105Pa,4气浮脱除胶体硅Cassell(Microflotation),1.0@10-3mol/LAl(NO3)310min(25mg/L),(2.5mL/L)pH,pH8~11,5min,90%,,Cassell:¹pH;º;»40~60Lm5电凝聚脱硅,,,,,,,44mg/L(37.5mg/L),1~2mg/L,19.2mg/L1.37mg/L,3.9mg/L0.26mg/L,,5.5mg/L,1~2mg/L,0.05mg/L[8],,60%~80%,,40mg/L2mA/cm2,50g/m3,0.6kW#h/m36离子交换脱硅#27#2000Vol.16No.4,,,,0.5mg/L,,0.02mg/L(0.005~0.03mg/L)3~10mg/L0.005~0.08mg/L,3.47mg/L(1.04mg/L,2.43mg/L)22,0.029mg/L,0,,0.007mg/L120mg/L(),1mg/L,,,7阻垢剂抑制硅垢的形成:,;,;,,,,10,,8其他的脱硅或抑垢方法W-ibowo,,,,,,,,,1mg/L,:[1]WibowoJ,ShadmanF,BlackfordD.16thSPWCC,1997.3:3-7.[2].[M].:,1995.27-28.[3],.[M].:,1992.218.[4]RoquesH.ChemicalWaterTreatment-PrinciplesandPractice[M].NewYork:VCHPublishersInc,1996.297-300.[5].[J].,1994,20(5):305-306.[6]BueckerB.Zerodischargeprogramsrequirecarefulplan-ning[J].PowerEngineering,1997,5:49-52.[7].[M]..:,1992.62.[8].[M].:.1995.43.[9]WibowoJ,ShadmanF,BlackfordD.MICRO,1997,15(5):5.:(010)62349447:1999-10-09#28#2000Vol.16No.4