化学氧化还原中和絮凝沉淀法处理电镀废水中铬的研究王勇

4　3()　()　Vol.4　No.3JOURNALOFGUIYANGCOLLEGE20099NaturalSciences(Quarterly)Sep.2009化学氧化还原-中和-絮凝沉淀法处理电镀废水中铬的研究＊王　勇1,郭勇2,李红兵2,唐宝华1(1.,　065000;2.,　300131)　:采用化学氧化还原-中和-絮凝沉淀法处理电镀废水中铬,研究了还原pH值、絮凝pH值、絮凝剂的用量、沉降时间对处理效果的影响。还原六价铬的最佳pH在2.0～2.2之间时,絮凝最佳pH值为9时,加入PAM,絮凝时间为0.5小时絮凝效果最好,处理后的Cr浓度最小。:化学氧化还原-中和-絮凝沉淀法;电镀废水;铬:X703　　:A　　:1673-6125(2009)03-0050-03StudyonRemovalofChromiuminElectroplateWastewaterbytheMethodofOxidation-Reduction-Neutralization-Flocculation-PrecipitationWANGYong1GUOYong2LIHong-bing2TANGBao-hua1(1.BasicCoursesTeachingDepartment,AcademyofArmedPolice,LangfangHebei065000,China;2.CNOOCTianjinResearchandDesignInstituteofChemicalIndustry,Tianjin300130,China)Abstract:StudyofremovalofChromiuminelectroplatewastewaterbythemethodofoxidation-reduction-neutralization-flocculation-precipitation.TheeffectofpHduringreduction,pHduringflocculation,theamountofflocculantandsedimentationtimeonthetreatmentofChromiumwarestudied.Theoptimalconditionare:pHduringreductionis2.0～2.2,pHduringflocculationis9,sedimentationtimeis0.5h.Keywords:oxidation-reduction-neutralization-flocculation-precipitation;electroplate;wastewater;chromium　　2004417,,,。,。,。、。,(CN-),。,(Cr)、(Ni)、(Cd)、(Cu)、(Zn)、(Au)、(Ag)。,[1],。,,,、、—50—＊:2009-06-10DOI:10.16856/j.cnki.52-1142/n.2009.03.015、。、,。、、、()、,[2-4]。--,,Cr(Ⅵ)Cr(Ⅲ)。1　1.1　pHS-3C();SolaarM6();722N()。PAM(:600-2000);、、。1.2　,Cr(OH)3,PAM,。(pH=2.0),,。::2H2Cr2O7+3Na2S2O5+3H2SO4=2Cr2(SO4)3+3Na2SO4+5H2O:Cr2(SO4)3+6NaOH=2Cr(OH)3↑+3Na2SO4(1)(0.6%)(2)(6%)(3)(6%)(4)PAM(0.1g/L)。,::25.00mL,0.2g/100mL1mL,。:。2　2.1　pH100mL50mg/L12500mL,pH3.27。,pH1.6、1.8、1.9、2.0、2.2、2.4、2.5、2.6、2.8、3.0、3.5、4.0,,20,pH,7～9,30,0.1mLPAM30,Cr6+,1。1　pHCr(VI)Fig.1　TheinfluenceofPHvalueontheCr(VI)reductionreaction　　1,pH2.5,Cr(VI),,pH2.0～2.2,Cr(VI),Cr(VI)0.1mg/L,pH2.0～2.2。2.2　pHpH,(50mg/L、100mg/L),pH。100mL50mg/L500mL,pH3.27。,pH2.0～2.2。—51—,20。pH,7～9.5,30。0.1mLPAM30,Cr。2,pH7～9.5,pH,pH,。2,pH9,Cr,pH,Cr,。2　100mL50mg/LpHFig.2　TheprocessedcomparisonofCrelectroplatingsolutionunderdifferentPHvalueof50mg/Lin100mLCr(VI)100mL500mg/L500mL,pH2.40。pH2.0～2.2,Na2S2O5,20,pH,pH(7～11),30。1mLPAM,12,Cr。3,,pH,Cr,pH7.08.5。500mg/L,。3,50mg/L,pH9,Cr,pH,Cr。3　100mL500mg/LpHFig.3　TheprocessedcomparisonofCrelectroplatingsolutionof500mg/Lin100mLunderdifferentPHvalues2.3　100mL100mg/L500mL,pH2.90。pH2.0～2.2。,20。pH8,30。pH,PAM0.1～0.8mL。30,Cr。PAM,4。4,100mg/L,PAM0.2mL。4　100mL100mg/LPAM,Fig.4　TheprocesseddensitycomparisonofCrelectroplatingsolutionof100mg/Lin100mL,addeddifferentPAMvolume(61)—52—200mg/L,、、100mg/L,6%,,。3.3　,0～1.00mg/L,0.9997。,7,310μg/L。3.4　,,。,,。“”,,“”,“”。3.5　0.6mg/L,8,1.82%。,(1),94%。1　Tab.1　Theaddingstandardrecoveryrate(mg/L)(mg/L)(%)(%)80.600.1881.82%943.6　,,,,,,,,,。:[1],.()[M].:,2002.[2]().[M].:,2006,10.(52)2.4　100mL50mg/L500mL,pH3.27。pH2.0～2.2。1mL,,20min。pH8,30min。pH,0.1mLPAM0.5h～4h,Cr,,5。5　100mL50mg/LFig.5　TheprocessedeffectivenesscomparisonindifferentsedimentationtimeofCrelectroplatingsolutionof50mg/Lin100mL　　5,,Cr,0.5,。3　--,pH、pH、、。pH2.0～2.2,pH9,PAM,0.5,Cr,Cr(Ⅵ)Cr(Ⅲ),。:[1],,.[J]..2002,25:8-9.[2],,.[J].,2004,27:111-113.[3].Cr(VI)[J].,2006,25(3):285-288.[4],,.[J].,2007,23(20):57-59.—61—