电子能量损失谱在Ni3Fe的环境氢脆机理研究中的应用

Ni3Fe1,1,1,2,2(1,100084,2,200072)[1,2]Ni3Fe,,,,,,,X,L2,3,,2pPearson[3]3d,Ni3Fe,Ni3FeNi22411Fe(),800P2h,470,(602001000hrs,XPS0133,01400144)1mm3mm12mm,MTS2810,JEOL2010F,200kVJEOL2010FGIF678200kV2mmNi3Fe,8(EELS)NiFe,1Ni3FeNi3FeH2,Ni3Fe,H2,64%86%Ni3FeH2,H2Ni3Fe1Ni3Fe(Û=210-3s-1)(h)InvacuumInhydrogen,%b,MPa,%b,MPaIH2%00411563210415921306001333419827161215629156410200014034158961181448111751610000144331895611418389138616TEM,,1,23Ni3FeEELSFeNiL2,3FeNi,EELSFeNi3d,2,FeNi3d,H2,Ni3FeJ.Chin.Electr.Microsc.Soc.21(5)5965972002©1995-2003TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.2EELSNi23dFe23dNi23dFe23dEfEf-1EN(e)dEPeVEfEf-1eVEN(E)dEPeV816501066152011181607619830169441831817701096187011381677710240171351240Ni3Fe,EELSNiFe3d,H2,:[1]MasahashiN,TakasugiT,IzumiO.JMaterSci,1990,25:4239.[2]LiuCT.ScriptaMetallMater,1992,27:25.[3]PearsonDH,AhnCC,FultzB.PhysicalReviewB,1993,47(14):847128478.1Ni3Fe(a);(b);(c)2Ni3FeEELSFeL2,33Ni3FeEELSNiL2,3J.Chin.Electr.Microsc.Soc.21(5)5965972002©1995-2003TsinghuaTongfangOpticalDiscCo.,Ltd.Allrightsreserved.