酸性镀铑工艺在电子工业中的应用①

3219975ELECTROCHEMISTRYVol.3No.2May1997963(200063),.,,,,.,,.,,,,.5m8,HV750800kgöcm2,,,1g.,.,.,,,.,,2L.,,.11.1()45göL()2030göL2030göLik0.10.2Aödm21996211226,19972032011.2,4050,,,450,1.5h,500,1h,580,3h,.2Rh+12KHSO4=Rh2(SO4)3+6K2SO4+3SO2+6H2O,,,,,().ä,,,,.1.35%H2SO4().22.1Rh2(SO4)3+6e2Rh+3SO2-42H++2eH22H2O-4eO2+4H+Rh3+-eRh4+Rh4+-2eRh6+2.2,,.,,.2.3,,.,H2O2,,Rh4+Rh6+Rh3+,.33.1,,,Rh,,,,.,.3.2SO42-Rh3+,,SO42-,,,,.3.3MgSO4,MgSO4,7022:1Rh(OH)3Fig.1Relationsbetweentemperatureandthepre2cipitateamountofRh(OH)3SO42-,,,,.44.1,,,,...,,MgSO4.pH,,pH2,Rh(OH)3,pH34,Rh(OH)3,.pH2.5.Rh(OH)3,,Rh(OH)3,1.,Rh(OH)3,.2530,,.4.21Tab.1EffectsofvariousimpuritiesontheoutwardappearanceofRhcoating(göL)Cu2+0.011Ni2+0.011Ag+0.01,0.1,0.1,Zn2+0.010.11,,NO3-0.011Cl-0.11,,,4.3,.100%,23.80219972()Fig.2InfluenceofcurrentdensityonthecurrentefficiencyforRhplatinginacidbaths3()Fig.3RelationshipbetweentheRhcontentincoatinglayerandcurrentefficiency5,,,.ApplicationofRhodiumPlatinginAcidBathstoElectronicIndustryMeiYing3SunGuanggui(50thInstitute,Dept.ofElect.Indus.,Shanghai200063)AbstractByusingthetechniqueofrhodiumplatinginacidsulphatebaths,theexcellentRhcoatingwhichhasagoodconductivityandhighresistancetoabrasioncanbeob2tainted.KeywordsRhodium,Rhplatinginacidsulphatebaths,ElectroplateReferences1..:,1989:2752782,,..,1992,12(3):99022: